EFFECTS OF PREPARATIVE ION-IMPLANTATION FOR APPLICATION IN PLASMA SOURCE NITRIDING OF METALS

被引：5

作者：

NUNOGAKI, M

SUEZAWA, H

KURATOMI, Y

MIYAZAKI, K

机构：

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1989年 / 39卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(89)90854-9

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：591 / 594

页数：4

共 6 条

[1] CHARACTERIZATION OF ALUMINUM NITRIDE LAYERS FORMED DIRECTLY BY 700-800 KEV N2+(N-15) IMPLANTATION INTO ALUMINUM [J].

KIDO, Y ;

KAKENO, M ;

YAMADA, K ;

HIOKI, T ;

KAWAMOTO, J ;

TADA, M .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1982, 15 (10) :2067-2077

[2] SURFACE STRESSES AND THE HARDNESS OF ION-IMPLANTED ALUMINUM [J].

MADAKSON, PB .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1985, 18 (03) :531-540

[3]

NUNOGAKI M, IN PRESS APPL SURF S

[4]

Okabe Y., 1983, Proceedings of the International Ion Engineering Congress. The 7th Symposium (1983 International) on Ion Sources and Ion Assisted Technology (ISIAT '83) and the 4th International Conference on Ion and Plasma Assisted Techniques (IPAT '83), P1811

[5]

SAITO K, 1988, P ISIAT 87 TOKYO, P633

[6] ELECTRON-SPECTROSCOPY FOR ATOMS, MOLECULES, AND CONDENSED MATTER [J].

SIEGBAHN, K .

REVIEWS OF MODERN PHYSICS, 1982, 54 (03) :709-728

← 1 →