ACTIVATION-ENERGY OF THE HOPPING CONDUCTIVITY OF THE DELTA-DOPED SEMICONDUCTOR IN THE LOW-DENSITY LIMIT

被引:11
作者
LEVIN, EI
RAIKH, ME
SHKLOVSKII, BI
机构
[1] TECH UNIV MUNICH,DEPT PHYS E-16,W-8046 GARCHING,GERMANY
[2] AF IOFFE PHYSICOTECH INST,LENINGRAD 194021,USSR
来源
PHYSICAL REVIEW B | 1991年 / 44卷 / 20期
关键词
D O I
10.1103/PhysRevB.44.11281
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We consider the impurity band structure of a system of multiple donor sheets, spaced significantly farther apart than the average in-plane donor separation. In a low-density limit the overlap of the wave functions of neighboring donors is relatively small and the spread of the energy levels is governed by the Coulomb shifts produced by the charged acceptors and donors. The activation energy of the hopping conductivity in the regime of nearest-neighbor hopping is equal to the Fermi-level position with respect to the isolated donor level, which is calculated as a function of the two-dimensional concentration of donors and the interplane distance assuming that the small degree of compensation is provided by the acceptors, which are distributed randomly between the sheets.
引用
收藏
页码:11281 / 11285
页数:5
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