ELECTRONIC STATES AND TRANSPORT-PROPERTIES OF AN N-TYPE DELTA-FUNCTION DOPING LAYER IN P-TYPE SI

被引:8
作者
TEMPEL, G [1 ]
KOCH, F [1 ]
ZEINDL, HP [1 ]
EISELE, I [1 ]
机构
[1] UNIV BUNDESWEHR,FACHBEREICH ELEKTROTECH,D-8014 NEUBIBERG,FED REP GER
来源
JOURNAL DE PHYSIQUE | 1987年 / 48卷 / C-5期
关键词
D O I
10.1051/jphyscol:1987555
中图分类号
学科分类号
摘要
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页码:259 / 262
页数:4
相关论文
共 3 条
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[2]   SCHOTTKY-BARRIER TUNNELING SPECTROSCOPY FOR THE ELECTRONIC SUBBANDS OF A DELTA-DOPING LAYER [J].
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[3]   GROWTH AND CHARACTERIZATION OF A DELTA-FUNCTION DOPING LAYER IN SI [J].
ZEINDL, HP ;
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EISELE, I ;
OPPOLZER, H ;
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APPLIED PHYSICS LETTERS, 1987, 50 (17) :1164-1166