THICKNESS AND REFRACTIVE-INDEX CHANGES ASSOCIATED WITH PHOTODARKENING IN EVAPORATED AS2S3 FILMS

被引：24

作者：

SHIMIZU, I

FRITZSCHE, H

机构：

[1] UNIV CHICAGO,INST PHYS,CHICAGO,IL 60637

[2] UNIV CHICAGO JAMES FRANCK INST,CHICAGO,IL 60637

来源：

JOURNAL OF APPLIED PHYSICS | 1976年 / 47卷 / 07期

关键词：

D O I：

10.1063/1.323036

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2969 / 2971

页数：3

共 12 条

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[6]

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OHMACHI, Y ;

IGO, T .

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[8] REVERSIBLE PHOTOINDUCED CHANGE IN INTERMOLECULAR DISTANCE IN AMORPHOUS AS2S3 NETWORK [J].

TANAKA, K .

APPLIED PHYSICS LETTERS, 1975, 26 (05) :243-245

[9] EVIDENCE FOR REVERSIBLE PHOTOSTRUCTURAL CHANGE IN LOCAL ORDER OF AMORPHOUS AS2S3 FILM [J].

TANAKA, K .

SOLID STATE COMMUNICATIONS, 1974, 15 (09) :1521-1524

[10] REFRACTIVE-INDEX DISPERSION IN SEMICONDUCTOR-RELATED THIN-FILMS [J].

WARNECKE, AJ ;

LOPRESTI, PJ .

IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1973, 17 (03) :256-262

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