FORMATION OF THIN FILMS OF SILICA BY ELECTRON BOMBARDMENT OF TRIPHENYLSILANOL

被引：13

作者：

WOODMAN, TP

机构：

来源：

BRITISH JOURNAL OF APPLIED PHYSICS | 1965年 / 16卷 / 03期

关键词：

D O I：

10.1088/0508-3443/16/3/310

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：359 / &

共 16 条

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KONIG, H .

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JOURNAL OF APPLIED PHYSICS, 1962, 33 (05) :1884-&

[6] FORMATION OF THIN POLYMER FILMS BY ELECTRON BOMBARDMENT [J].

CHRISTY, RW .

JOURNAL OF APPLIED PHYSICS, 1960, 31 (09) :1680-1683

[7] THE SOURCES OF ELECTRON-INDUCED CONTAMINATION IN KINETIC VACUUM SYSTEMS [J].

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[8]

HAEFER R, 1956, 3 P INT C EL MICR, P466

[9] UBER DUNNE AUS KOHLENWASSERSTOFFEN DURCH ELEKTRONENBESCHUSSGEBILDETE ODER LONENBESCHUSS GEBILDETE SCHICHTEN [J].

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[10]

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