PROCESS TECHNOLOGY FOR RADIATION-HARDENED CMOS INTEGRATED-CIRCUITS

被引：30

作者：

DAWES, WR ^{[1
]}

DERBENWICK, GF ^{[1
]}

GREGORY, BL ^{[1
]}

机构：

[1] SANDIA LABS,ALBUQUERQUE,NM 87115

来源：

IEEE JOURNAL OF SOLID-STATE CIRCUITS | 1976年 / 11卷 / 04期

关键词：

D O I：

10.1109/JSSC.1976.1050759

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：459 / 465

页数：7

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