GRAZING X-RAY REFLECTION ANALYSIS OF NANOMETRIC SCALE STRUCTURES

Grazing x-ray reflection (GXR) has been performed on thick WN layers and on C/W multilayer mirrors deposited in a diode rf-sputtering system. In the first case, we show that GXR can provide not only the layer thickness but also precise information on the occurrence of intermediate layers (native oxide superlayer, reactionlike sublayer). The relative thickness of each layer is determined very precisely. The GXR analysis of C/W multilayers can be perfectly interpreted using a physical model which includes a thickness drift during the deposit, an interface layer between W and C layers due to the interdiffusion, and interface roughness. In each case, the GXR simulation models are confirmed by in situ kinetic ellipsometry and ex situ transmission electron microscopy. Moreover, in the W/C multilayer case the soft x-ray reflectivity calculated at the CK-alpha line assuming the same model agree very well with the experimental value.