ENERGY-RESOLVED ANGULAR-DISTRIBUTIONS OF O+ IONS AT THE RADIO-FREQUENCY-POWERED ELECTRODE IN REACTIVE ION ETCHING

被引:27
作者
JANES, J
HUTH, C
机构
[1] Fraunhofer Institut fur Mikrostrukturtechnik, Berlin, 33
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1992年 / 10卷 / 05期
关键词
D O I
10.1116/1.577869
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Mass-selected distributions of bombardment energies of 0 + ions at the powered electrode of a reactive ion etcher are investigated under angles between +/- 10-degrees with respect to the electrode normal. The energy distributions consist of split high-energy peaks and continuous intensities between 50 eV and the maximal energy defined by the potential drop across the sheath. Ions found in the bimodal split high-energy peaks show angular distributions with widths between 2-degrees and 6-degrees [full width at half-maximum (FWHM)]. The continuous part of the ion energy distributions exhibit angular widths between 7-degrees and 11-degrees (FWHM). The observed phenomena in the ion energy and ion angular distributions are interpreted as combined effects of elastic scattering and dissociative collisions in the sheath.
引用
收藏
页码:3086 / 3091
页数:6
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