UHV MICROSCOPY OF SURFACES

被引：13

作者：

MARKS, LD ^{[1
]}

AI, R ^{[1
]}

BONEVICH, JE ^{[1
]}

BUCKETT, MI ^{[1
]}

DUNN, D ^{[1
]}

ZHANG, JP ^{[1
]}

JACOBY, M ^{[1
]}

STAIR, PC ^{[1
]}

机构：

[1] NORTHWESTERN UNIV,CTR SURFACE RADIAT DAMAGE STUDIES,DEPT CHEM,EVANSTON,IL 60208

来源：

ULTRAMICROSCOPY | 1991年 / 37卷 / 1-4期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1016/0304-3991(91)90009-U

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

Results are reported using UHV electron microscopy to determine the role of background gases in influencing surface damage experiments and on the gold (001) surface prepared by ion-beam cleaning/thinning and annealing. In maximum valence oxides the end product is a higher-symmetry oxide or metal in UHV, but in a non-UHV environment secondary reactions take place. No evidence is found for electronic damage of non-maximal valence oxides, only sputtering and electron-stimulated reactions. For the gold (001) surface we have reproduced conventional surface-science preparations using ion-beam cleaning and annealing to produce the known reconstructed hexagonal monolayer on the surface.

引用

页码：90 / 102

页数：13

共 73 条

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