ELECTRON-MICROSCOPY STUDIES OF NB-AL2O3 INTERFACES FORMED BY MOLECULAR-BEAM EPITAXY

被引：21

作者：

MAYER, J

DURA, JA

FLYNN, CP

RUHLE, M

机构：

[1] UNIV CALIF SANTA BARBARA,DEPT MAT,SANTA BARBARA,CA 93106

[2] UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801

来源：

SURFACE & COATINGS TECHNOLOGY | 1990年 / 43-4卷 / 1-3期

关键词：

D O I：

10.1016/0257-8972(90)90074-M

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Niobium films were grown by molecular beam epitaxy on sapphire substrates of different orientations. A unique three-dimensional orientation relationship was determined between the Al2O3 substrate and the niobium film independent of substrate orientation: (0001)s parallel-to (111)Nb and [21BAR1BAR0]s parallel-to [11BAR0]Nb. This observation is in contrast with topotaxial relationships obtained between Al2O3 particles formed by internal oxidation of NbAl alloys where close-packed planes are parallel: (0001)s parallel-to (110)Nb. The atomistic structure of the interface was identified by high resolution electron microscopy. Regions of good matching alternate with regions which contain localized misfit dislocations. These observations will be discussed and compared with results published in the literature.

引用

页码：199 / 212

页数：14

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