RATIONAL FORMALISM OF THE RESIDUAL-STRESS DETERMINATION METHOD BY X-RAY-DIFFRACTION - APPLICATION ON THIN-FILMS AND MULTILAYERS

被引：21

作者：

BADAWI, KF ^{[1
]}

KAHLOUN, C ^{[1
]}

GRILHE, J ^{[1
]}

机构：

[1] LPMTM,F-93430 VILLETANEUSE,FRANCE

来源：

JOURNAL DE PHYSIQUE III | 1993年 / 3卷 / 06期

关键词：

D O I：

10.1051/jp3:1993108

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The use of the rational formalism in the residual stress determination method by X-ray diffraction improves the precision and the mathematical elegance of this method. It eliminates the approximations made in the conventional formalism, and corrects the results by more than 15 % in certain case of thin films and multilayers.

引用

页码：1183 / 1188

页数：6

共 14 条

[1] RESIDUAL-STRESS DETERMINATION IN A 1000 A TUNGSTEN THIN-FILMS BY X-RAY-DIFFRACTION
BADAWI, KF
DECLEMY, A
NAUDON, A
GOUDEAU, P
[J]. JOURNAL DE PHYSIQUE III, 1992, 2 (09): : 1741 - 1748
[2] BADAWI KF, 1985, 34TH P ANN C APPL XR, P59
[3] BADAWI KF, 1986, THESIS U REIMS
[4] BADAWI KF, IN PRESS APPL SURF S
[5] BADAWI KF, IN PRESS NUCL I ME B
[6] BADAWI KF, 1987, MATERIAUX STRUCTURES, P295
[7] CASTEX L, 1981, PUB SCI TECH
[8] DOLLE H, 1980, METALL TRANS A, V11, P159
[9] INFLUENCE OF MULTIAXIAL STRESS STATES, STRESS GRADIENTS AND ELASTIC-ANISOTROPY ON THE EVALUATION OF (RESIDUAL) STRESSES BY X-RAYS
DOLLE, H
[J]. JOURNAL OF APPLIED CRYSTALLOGRAPHY, 1979, 12 (DEC): : 489 - 501
[10] DOLLE H, 1979, J METALLK, V70, P682

← 1 2 →