THE FORMATION AND STRUCTURE OF CVD W FILMS PRODUCED BY THE SI REDUCTION OF WF6

被引:43
作者
GREEN, ML
ALI, YS
BOONE, T
DAVIDSON, BA
FELDMAN, LC
NAKAHARA, S
机构
关键词
D O I
10.1149/1.2100872
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:2285 / 2292
页数:8
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