MAGNETICALLY SHAPED RF DISCHARGE FOR POLYMER FILM FORMATION

[1] LOW-TEMPERATURE DEPOSITION OF SILICON OXIDE FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1963, 110 (05) : 465 - 465

[2] ELECTRICAL PROPERTIES OF THIN ORGANIC FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1963, 110 (01) : 15 - 22

[3] EPOXY DIELECTRIC FILMS PRODUCED BY ELECTRON BOMBARDMENT [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (12) : 1194 - &

[4] FORMATION OF THIN POLYMER FILMS BY ELECTRON BOMBARDMENT [J]. JOURNAL OF APPLIED PHYSICS, 1960, 31 (09) : 1680 - 1683

[5] DASILVA EM, 1964, ELECTROCHEM TECH, V2, P147

[6] DUSHMAN S, 1962, F VACUUM TECHNIQUE

[7] Flory P. J., 1953, PRINCIPLES POLYM CHE, P133

[8] THE FORMATION OF THIN POLYMER FILMS IN THE GAS DISCHARGE [J]. JOURNAL OF POLYMER SCIENCE, 1960, 44 (144): : 551 - 552

[9] GREGOR LV, 1963, 5 P EL BEAM S BOST, P211

[10] POLYMERIZATION OF BUTADIENE GAS ON SURFACES UNDER LOW ENERGY ELECTRON BOMBARDMENT [J]. JOURNAL OF PHYSICAL CHEMISTRY, 1963, 67 (09) : 1784 - &

[1] LOW-TEMPERATURE DEPOSITION OF SILICON OXIDE FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1963, 110 (05) : 465 - 465

[2] ELECTRICAL PROPERTIES OF THIN ORGANIC FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1963, 110 (01) : 15 - 22

[3] EPOXY DIELECTRIC FILMS PRODUCED BY ELECTRON BOMBARDMENT [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (12) : 1194 - &

[4] FORMATION OF THIN POLYMER FILMS BY ELECTRON BOMBARDMENT [J]. JOURNAL OF APPLIED PHYSICS, 1960, 31 (09) : 1680 - 1683

[5] DASILVA EM, 1964, ELECTROCHEM TECH, V2, P147

[6] DUSHMAN S, 1962, F VACUUM TECHNIQUE

[7] Flory P. J., 1953, PRINCIPLES POLYM CHE, P133

[8] THE FORMATION OF THIN POLYMER FILMS IN THE GAS DISCHARGE [J]. JOURNAL OF POLYMER SCIENCE, 1960, 44 (144): : 551 - 552

[9] GREGOR LV, 1963, 5 P EL BEAM S BOST, P211

[10] POLYMERIZATION OF BUTADIENE GAS ON SURFACES UNDER LOW ENERGY ELECTRON BOMBARDMENT [J]. JOURNAL OF PHYSICAL CHEMISTRY, 1963, 67 (09) : 1784 - &