ANALYSIS OF FEF3 AND NIF2 THIN-FILMS BY USING RBS, (ALPHA, X) REACTIONS, AND SIMS MEASUREMENTS

被引：19

作者：

GEVERS, G

BARRIERE, AS

GRANNEC, J

LOZANO, L

BLANCHARD, B

机构：

[1] CNRS,CHIM SOLIDE LAB,F-33405 TALENCE,FRANCE

[2] CEN GRENOBLE,SEAPC,F-38401 GRENOBLE,FRANCE

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1984年 / 81卷 / 01期

关键词：

D O I：

10.1002/pssa.2210810110

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：105 / 122

页数：18

共 19 条

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