DIFFUSION OF IMPURITIES IN AMORPHOUS-SILICON

被引:20
作者
KHAIT, YL [1 ]
BRENER, R [1 ]
BESERMAN, R [1 ]
机构
[1] TECHNION ISRAEL INST TECHNOL,DEPT PHYS,IL-32000 HAIFA,ISRAEL
来源
PHYSICAL REVIEW B | 1988年 / 38卷 / 09期
关键词
D O I
10.1103/PhysRevB.38.6107
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:6107 / 6112
页数:6
相关论文
共 34 条
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