ON THE REDUCTION OF CARRIER SPILLING EFFECTS DURING RESISTANCE MEASUREMENTS WITH THE SPREADING IMPEDANCE PROBE

被引:3
作者
CZECH, I
CLARYSSE, T
VANDERVORST, W
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 01期
关键词
D O I
10.1116/1.587157
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Despite the rapidly increasing capabilities of Poisson deconvolution schemes for spreading resistance (SR) measurements, carrier spilling effects will remain a serious problem for the interpretation of SR profiles for structures involving significant forward spilling such as epilayers. In order to remedy this situation a spreading impedance probe is being developed allowing to influence the internal spilling by an external dc field, while performing an impedance measurement at a small ac bias. Three-dimensional calibration surfaces representing resistance versus resistivity and dc bias determine the probe characteristics. Results for a p well and a p . p+ epilayer will be discussed.
引用
收藏
页码:298 / 303
页数:6
相关论文
共 12 条
[1]   OPTIMIZATION OF THE SPREADING RESISTANCE PROFILING TECHNIQUE FOR SUBMICRON STRUCTURES [J].
BERKOWITZ, HL ;
BURNELL, DM ;
HILLARD, RJ ;
MAZUR, RG ;
RAICHOUDHURY, P .
SOLID-STATE ELECTRONICS, 1990, 33 (06) :773-781
[2]   COMPARISON OF CARRIER PROFILES FROM SPREADING RESISTANCE ANALYSIS AND FROM MODEL-CALCULATIONS FOR ABRUPT DOPING STRUCTURES [J].
CASEL, A ;
JORKE, H .
APPLIED PHYSICS LETTERS, 1987, 50 (15) :989-991
[3]   SPREADING RESISTANCE ANALYSIS BASED ON THE METHOD OF REGULARIZATION [J].
CHOO, SC ;
LEONG, MS ;
LEE, YT .
SOLID-STATE ELECTRONICS, 1993, 36 (01) :1-11
[4]   AUTOMATIC-GENERATION OF SHALLOW ELECTRICALLY ACTIVE DOPANT PROFILES FROM SPREADING RESISTANCE MEASUREMENTS [J].
CLARYSSE, T ;
VANDERVORST, W .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (01) :290-297
[5]   A POISSON SOLVER FOR SPREADING RESISTANCE ANALYSIS [J].
DICKEY, DH .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (01) :438-442
[6]  
LEONG MS, 1992, J VAC SCI TECHNOL B, V10, P438
[7]   DOPANT PROFILE EXTRACTION FROM SPREADING RESISTANCE MEASUREMENTS [J].
MATHUR, R .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (01) :421-425
[8]   POISSON-BASED ANALYSIS OF SPREADING RESISTANCE PROFILES [J].
MAZUR, RG .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (01) :397-407
[9]   SPREADING RESISTANCE - A QUANTITATIVE TOOL FOR PROCESS-CONTROL AND DEVELOPMENT [J].
PAWLIK, M .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (01) :388-396
[10]   AC IMPEDANCE METHOD FOR HIGH-RESISTIVITY MEASUREMENTS OF SILICON [J].
THURBER, WR ;
LOWNEY, JR ;
LARRABEE, RD ;
EHRSTEIN, JR .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1991, 138 (10) :3081-3085