DEPOSITION AND CHARACTERIZATION OF FULLERENE FILMS

被引:320
作者
HEBARD, AF
HADDON, RC
FLEMING, RM
KORTAN, AR
机构
关键词
D O I
10.1063/1.106095
中图分类号
O59 [应用物理学];
学科分类号
摘要
Thermal sublimation of pure C60 and C70 has been used for depositing well-characterized fullerene films on a variety of substrates. Film purity is determined by infrared absorption spectra and the extent of crystallinity of the face-centered cubic structure by x rays. Thickness-dependent optical and electrical measurements reveal uniform films over the thickness range 200-1000 angstrom. We obtain optical absorption coefficients having values between those of Si and Ge and a relative permittivity having a value close to that of amorphous SiO2.
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页码:2109 / 2111
页数:3
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