ACCOMMODATION OF STRAIN IN ULTRATHIN INAS/GAAS FILMS

被引:30
作者
WOICIK, JC [1 ]
PELLEGRINO, JG [1 ]
SOUTHWORTH, SH [1 ]
SHAW, PS [1 ]
KARLIN, BA [1 ]
BOULDIN, CE [1 ]
MIYANO, KE [1 ]
机构
[1] CUNY BROOKLYN COLL, DEPT PHYS, BROOKLYN, NY 11210 USA
关键词
D O I
10.1103/PhysRevB.52.R2281
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
X-ray standing-wave and extended x-ray-absorption fine-structure measurements have determined the strain and bond distortions in a buried InAs monolayer grown epitaxially on GaAs(001). The In atoms are found to reside 1.64+/-0.03 Angstrom above the last-As plane of the GaAs substrate with an In-As bond length of 2.57+/-0.02 Angstrom. Relative to bulk InAs, this corresponds to an 8% expansion in the In-As planar distance perpendicular to the interface and a 0.05-Angstrom compression in the In-As bond length. This experiment indicates that macroscopic-elastic theory describes the distortions in InAs/GaAs(001) films even in the monolayer limit.
引用
收藏
页码:R2281 / R2284
页数:4
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