OSCILLATION OF THE LATTICE-RELAXATION IN LAYER-BY-LAYER EPITAXIAL-GROWTH OF HIGHLY STRAINED MATERIALS

被引:132
作者
MASSIES, J
GRANDJEAN, N
机构
[1] Laboratoire de Physique du Solide et Energie Solaire, Centre National de la Recherche Scientifique, Sophia-Antipolis
关键词
D O I
10.1103/PhysRevLett.71.1411
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
It is shown that during the growth of InxGa1-xAs on GaAs, the strain-induced lattice distortion oscillates as a function of monolayer completion in both purely 2D and quasi-2D layer-by-layer growth regimes. This is explained by considering that nontetragonal elastic distortion occurs at the free edges of 2D monolayer islands. Numerical relaxation using a simplified model of interatomic forces gives the correct order of magnitude of the strain relaxation by this process.
引用
收藏
页码:1411 / 1414
页数:4
相关论文
共 14 条