INTERFACIAL STRAIN IN ALXGA1-XAS LAYERS ON GAAS

被引:21
作者
SPERIOSU, VS
NICOLET, MA
TANDON, JL
YEH, YCM
机构
[1] CALTECH,PASADENA,CA 91125
[2] APPL SOLAR ENERGY CORP,CITY IND,CA 91749
关键词
BAND STRUCTURE - Analysis - METALS AND ALLOYS - Vapor Deposition - SPECTROSCOPIC ANALYSIS - STRAIN;
D O I
10.1063/1.334490
中图分类号
O59 [应用物理学];
学科分类号
摘要
Detailed analysis of x-ray rocking curves was used to determine the depth profile of strain and composition in a 2500-A-thick layer of Al//xGa//1// minus //xAs grown by metalorganic chemical vapor deposition on LT AN BR 100 RT AN BR GaAs. The x value and layer thickness were in good agreement with the values expected from growth parameters. The presence of a transition region, 280 A thick, was detected by the rocking curve. In this region, the Al concentration varies smoothly from 0 to 0. 87. Measurement and control of the sharpness of such interfaces has important implications for heterojunction devices.
引用
收藏
页码:1377 / 1379
页数:3
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