POLY(METHYL ALPHA-TRIFLUOROMETHYLACRYLATE) AS A POSITIVE ELECTRON-BEAM RESIST

被引:18
作者
WILLSON, CG
ITO, H
MILLER, DC
TESSIER, TG
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关键词
D O I
10.1002/pen.760231805
中图分类号
TQ [化学工业];
学科分类号
0817 ;
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页码:1000 / 1003
页数:4
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