AN IMPROVED MODEL TO EXPLAIN OHMIC CONTACT RESISTANCE OF N-GAAS AND OTHER SEMICONDUCTORS - COMMENTS

被引:1
作者
GUPTA, RP
KHOKLE, WS
机构
[1] Central Electronics Engineering, Research Inst, Pilani, India, Central Electronics Engineering Research Inst, Pilani, India
关键词
ELECTRIC CONTACTS; OHMIC - Electric Conductivity;
D O I
10.1016/0038-1101(87)90228-0
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Dingfen et al. report on the influence of a high-low barrier on the contact resistivity of metal-semiconductor structures. We point out that a similar study has already been published by us. However, we hypothesized thermionic emission as the dominant mode of carrier transport across the high-low barrier whereas Dingfen et al. employed diffusion theory to calculate the resistance of this barrier. In this note we argue that our theory interprets the published experimental data convincingly and thus the theory used by Dingfen et al. is questionable.
引用
收藏
页码:672 / 672
页数:1
相关论文
共 2 条
[1]  
DINGFEN W, 1986, SOLID STATE ELECTRON, V29, P489
[2]   TRANSPORT ACROSS A HIGH-LOW BARRIER AND ITS INFLUENCE ON SPECIFIC CONTACT RESISTIVITY OF A METAL-N-GAAS OHMIC SYSTEM [J].
GUPTA, RP ;
KHOKLE, WS .
IEEE ELECTRON DEVICE LETTERS, 1985, 6 (06) :300-303