CURRENT RUNAWAY IN INSULATORS AFFECTED BY IMPACT IONIZATION AND RECOMBINATION

被引：90

作者：

KLEIN, N

SOLOMON, P

机构：

[1] TECHNION ISRAEL INST TECHNOL,HAIFA,ISRAEL

[2] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF APPLIED PHYSICS | 1976年 / 47卷 / 10期

关键词：

D O I：

10.1063/1.322440

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：4364 / 4372

页数：9

相关论文

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