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DEPOSITION OF TIN AND TI(O,C,N) HARD COATINGS BY A PLASMA ASSISTED CHEMICAL VAPOR-DEPOSITION PROCESS

被引：40
作者：
MAYR, P
STOCK, HR
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 06期
关键词：
D O I：
10.1116/1.573714
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
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页码：2726 / 2730
页数：5
相关论文
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[6]   MECHANISMS OF REACTIVE SPUTTERING OF TITANIUM NITRIDE AND TITANIUM CARBIDE .1. INFLUENCE OF PROCESS PARAMETERS ON FILM COMPOSITION [J].
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