OXIDATION OF SILICON-NITRIDE HOT-PRESSED WITH Y2O3+MGO

[21] THERMODYNAMICS AND KINETICS OF OXIDATION OF HOT-PRESSED SILICON-NITRIDE [J]. JOURNAL OF MATERIALS SCIENCE, 1976, 11 (03) : 500 - 509

[22] OXIDATION OF SI3N4 IN RANGE 1300DEGREESC TO 1500DEGREESC [J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1976, 59 (9-10) : 399 - 403

[23] WEAVER GQ, 1978, AM CERAM SOC BULL, V57, P1131

[24] STABILITY OF SILICON YTTRIUM OXYNITRIDES [J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1976, 59 (5-6) : 269 - 270

[25] JCPDS201416 INT CTR

[26] JCPDS211460 INT CTR

[27] JCPDS211457 INT CTR

[28] JCPDS221103 INT CTR

[29] JCPDS221004 INT CTR

[30] JCPDS211459 INT CTR

[21] THERMODYNAMICS AND KINETICS OF OXIDATION OF HOT-PRESSED SILICON-NITRIDE [J]. JOURNAL OF MATERIALS SCIENCE, 1976, 11 (03) : 500 - 509

[22] OXIDATION OF SI3N4 IN RANGE 1300DEGREESC TO 1500DEGREESC [J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1976, 59 (9-10) : 399 - 403

[23] WEAVER GQ, 1978, AM CERAM SOC BULL, V57, P1131

[24] STABILITY OF SILICON YTTRIUM OXYNITRIDES [J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1976, 59 (5-6) : 269 - 270

[25] JCPDS201416 INT CTR

[26] JCPDS211460 INT CTR

[27] JCPDS211457 INT CTR

[28] JCPDS221103 INT CTR

[29] JCPDS221004 INT CTR

[30] JCPDS211459 INT CTR