TEMPERATURE-DEPENDENCE OF ABSORPTION-EDGE OF VITREOUS SILICA

被引：9

作者：

BATES, CW ^{[1
]}

机构：

[1] STANFORD UNIV,STANFORD,CA 94305

来源：

APPLIED OPTICS | 1976年 / 15卷 / 12期

关键词：

D O I：

10.1364/AO.15.002976

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：2976 / 2978

页数：3

共 16 条

[1] TRANSMISSIVITY AND ABSORPTION OF FUSED QUARTZ BETWEEN 0.22MU AND 3.5MU FROM ROOM TEMPERATURE TO 1500 DEGREES C [J].

BEDER, EC ;

BASS, CD ;

SHACKLEF.WL .

APPLIED OPTICS, 1971, 10 (10) :2263-&

[2] PHONON-GENERATED MICROFIELDS AND HIGH-TEMPERATURE SHIFT OF ABSORPTION-EDGE IN CUBIC ZNS [J].

BRADA, Y ;

YACOBI, BG ;

PELED, A .

PHYSICAL REVIEW B, 1975, 12 (08) :3494-3496

[3]

Bruckner R., 1970, Journal of Non-Crystalline Solids, V5, P123, DOI 10.1016/0022-3093(70)90190-0

[4] TEMPERATURE-DEPENDENCE OF FUNDAMENTAL EDGE OF GERMANIUM AND ZINCBLENDE-TYPE SEMICONDUCTORS [J].

CAMASSEL, J ;

AUVERGNE, D .

PHYSICAL REVIEW B, 1975, 12 (08) :3258-3267

[5]

DOW JD, 1972, PHYS REV B, V5, P584

[6]

DOW JD, 1972, COMMENTS SOLID STATE, V4, P35

[7] OPTICAL TRANSMITTANCE OF FUSED SILICA AT ELEVATED TEMPERATURES [J].

EDWARDS, OJ .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1966, 56 (10) :1314-&

[8] OPTICAL METHOD OF MEASURING TEMPERATURE IN HOT GLASS [J].

JERYAN, RA ;

GLICKSMAN, LR ;

ERYOU, ND .

JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1972, 55 (02) :71-+

[9]

KINGERY W, 1960, INTRO CERAMICS, P706

[10]

KNOX RS, 1963, THEORY EXCITONS, pCH3

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