ION-INDUCED GRAIN-GROWTH IN MULTILAYER AND COEVAPORATED METAL ALLOY THIN-FILMS

被引:21
作者
ALEXANDER, DE [1 ]
WAS, GS [1 ]
REHN, LE [1 ]
机构
[1] ARGONNE NATL LAB, ARGONNE, IL 60439 USA
基金
美国国家科学基金会;
关键词
D O I
10.1016/0168-583X(91)95260-K
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Irradiation experiments were conducted on multilayer (ML) and coevaporated (CO) thin films in order to examine the role that the heat-of-mixing (DELTA-H(mix)) has in ion-induced grain growth. Room-temperature irradiations using 1.7 MeV Xe were performed in the High Voltage Electron Microscope at Argonne National Laboratory. The alloys studied (Pt-Ti, Pt-V, Pt-Ni, Au-Co and Ni-Al) spanned a large range of DELTA-H(mix) values. Comparison of grain growth rates between ML and CO films of a given alloy confirmed a heat of mixing effect. Differences in grain growth rates between ML and CO films scaled according to the sign and magnitude of DELTA-H(mix) of the system (with the exception of the Pt-V system). Substantial variations in growth rates among CO alloy films experiencing similar irradiation damage demonstrated that a purely collisional approach is inadequate for describing ion-induced grain growth and consideration must also be given to material-specific properties. Results from CO alloy films were consistent with a thermal spike model of ion-induced grain growth. The grain boundary mobility was observed to be proportional to the thermal spike-related parameter, F(D)2/DELTA-H(coh)3, where F(D) is the energy deposited in nuclear interactions and DELTA-H(coh) is the cohesive energy.
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页码:462 / 466
页数:5
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