IS THE SEGREGATION DISSOLUTION KINETICS DRIVEN BY A SURFACE LOCAL EQUILIBRIUM - AN ANSWER VIA THE KINETIC TIGHT-BINDING ISING-MODEL

被引:72
作者
SENHAJI, A
TREGLIA, G
LEGRAND, B
BARRETT, NT
GUILLOT, C
VILLETTE, B
机构
[1] CTR UNIV PARIS SUD,PHYS SOLIDES LAB,F-91405 ORSAY,FRANCE
[2] CTR ETUD SACLAY,RECH MET PHYS SECT,DTM,F-91191 GIF SUR YVETTE,FRANCE
[3] CTR UNIV PARIS SUD,UTILISAT RAYONNEMENT ELECTROMAGNET LAB,F-91405 ORSAY,FRANCE
关键词
D O I
10.1016/0039-6028(92)90535-E
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We study here the relation between the surface segregation at thermodynamical equilibrium in an alloy A(c)B1-c and the kinetics of either segregation in the system A-B or dissolution of A/B or B/A. This is possible within a new kinetic model based on the electronic structure: the kinetic tight-binding Ising model (KTBIM). In particular, the existence of a local equilibrium between the surface and the first underlayer is stressed. Some illustrations are given in the particular case of the W-Re system.
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页码:297 / 305
页数:9
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