THEORETICAL CONSIDERATIONS ON SENSITIVITIES OF ELECTRON-BEAM RESISTS

被引:12
作者
TSUDA, M [1 ]
OIKAWA, S [1 ]
SUZUKI, A [1 ]
机构
[1] CHIBA UNIV,FAC PHARMACEUT SCI,PHYS CHEM LAB,CHIBA 280,JAPAN
关键词
D O I
10.1002/pen.760170612
中图分类号
TQ [化学工业];
学科分类号
0817 ;
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页码:390 / 395
页数:6
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