HIGH-SPEED LOW-POWER X-RAY LITHOGRAPHY

被引：25

作者：

LENZO, PV ^{[1
]}

SPENCER, EG ^{[1
]}

机构：

[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974

来源：

APPLIED PHYSICS LETTERS | 1974年 / 24卷 / 06期

关键词：

D O I：

10.1063/1.1655187

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：289 / 291

页数：3

共 18 条

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[2]

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BOWDEN MJ, TO BE PUBLISHED

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[5]

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[7] EPOXIDE-CONTAINING POLYMERS AS HIGHLY SENSITIVE ELECTRON-BEAM RESISTS [J].

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HATANO, Y ;

NONOGAKI, S .

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[8] ELECTROCHEMICALL THINNED N/N+ EPITAXIAL SILICON - METHOD AND APPLICATIONS [J].

MEEK, RL .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (07) :1240-+

[9] PREPARATION OF SUPPORTED, LARGE-AREA, UNIFORMLY THIN SILICON FILMS FOR PARTICLE-CHANNELING STUDIES [J].

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[10]

MELLIARSMITH CM, TO BE PUBLISHED

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