INTERFACE STATES AND INTERFACE DISORDER IN SI-SIO2 SYSTEM

被引:41
作者
REVESZ, AG
ZAININGER, KH
EVANS, RJ
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D O I
10.1016/0022-3697(67)90108-4
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O6 [化学];
学科分类号
0703 ;
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页码:197 / +
页数:1
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共 27 条
[1]   ORIENTATION DEPENDENCE OF BUILT-IN SURFACE CHARGE ON THERMALLY OXIDIZED SILICON [J].
BALK, P ;
BURKHARD.PJ ;
GREGOR, LV .
PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, 1965, 53 (12) :2133-&
[2]  
BALK P, 1965, MAY M EL SOC SAN FRA
[3]   N-TYPE SURFACE CONDUCTIVITY ON P-TYPE GERMANIUM [J].
BROWN, WL .
PHYSICAL REVIEW, 1953, 91 (03) :518-527
[4]  
DELORD JF, 1965, B AM PHYS SOC, V10, P546
[5]   DENSITY OF SIO2-SI INTERFACE STATES - (MOS DEVICES SI OXIDATION 100 DEGREES C O2 + 80 PPM H2O FERMI LEVEL E) [J].
GRAY, PV ;
BROWN, DM .
APPLIED PHYSICS LETTERS, 1966, 8 (02) :31-&
[6]  
Hetherington G, 1962, PHYS CHEM GLASSES-B, V3, P129
[7]  
HURD RM, 1963, ANN NY ACAD SCI, V101, P876
[8]  
KOOI E, 1965, PHILIPS RES REP, V20, P578
[9]   ON THE LOGARITHMIC RATE LAW IN CHEMISORPTION AND OXIDATION [J].
LANDSBERG, PT .
JOURNAL OF CHEMICAL PHYSICS, 1955, 23 (06) :1079-1087
[10]  
LEE RW, 1964, PHYS CHEM GLASSES-B, V5, P35