INFRARED STUDY OF THE KINETICS OF OXIDATION IN POROUS AMORPHOUS-SILICON

被引：23

作者：

KOROPECKI, RR

ARCE, R

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1986年 / 60卷 / 05期

关键词：

D O I：

10.1063/1.337223

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1802 / 1807

页数：6

共 32 条

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