DIFLUOROCARBENE EMISSION-SPECTRA FROM FLUOROCARBON PLASMAS AND ITS RELATIONSHIP TO FLUOROCARBON POLYMER FORMATION

被引:73
作者
MILLARD, MM
KAY, E
机构
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D O I
10.1149/1.2123747
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:160 / 165
页数:6
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共 48 条
[1]   THE BAND-SPECTRUM OF CARBON MONOFLUORIDE, CF [J].
ANDREWS, EB ;
BARROW, RF .
PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON SECTION A, 1951, 64 (377) :481-&
[2]  
BASCO N, 1971, CHEM PHYS LETT, V8, P291, DOI 10.1016/0009-2614(71)85015-7
[3]   ABSORPTION SPECTRUM OF CF2 TRAPPED IN AN ARGON MATRIX [J].
BASS, AM ;
MANN, DE .
JOURNAL OF CHEMICAL PHYSICS, 1962, 36 (12) :3501-&
[4]  
Bell A. T., 1974, Techniques and applications of plasma chemistry, P1
[5]  
BELL AT, 1976, PLASMA CHEM POLYM, P1
[6]  
CLYNE MAA, 1979, REACTIVE INTERMEDIAT, P1
[7]   PLASMA-ETCHING - DISCUSSION OF MECHANISMS [J].
COBURN, JW ;
WINTERS, HF .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02) :391-403
[8]   INSITU AUGER-ELECTRON SPECTROSCOPY OF SI AND SIO2 SURFACES PLASMA ETCHED IN CF4-H2 GLOW-DISCHARGES [J].
COBURN, JW .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (08) :5210-5213
[9]   SOME CHEMICAL ASPECTS OF THE FLUOROCARBON PLASMA ETCHING OF SILICON AND ITS COMPOUNDS [J].
COBURN, JW ;
KAY, E .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1979, 23 (01) :33-41
[10]   OPTICAL-EMISSION SPECTROSCOPY OF REACTIVE PLASMAS - A METHOD FOR CORRELATING EMISSION INTENSITIES TO REACTIVE PARTICLE DENSITY [J].
COBURN, JW ;
CHEN, M .
JOURNAL OF APPLIED PHYSICS, 1980, 51 (06) :3134-3136