EFFICIENCY OF THE SIH4 OXIDATION REACTION IN CHEMICAL VAPOR-DEPOSITION OF SIO2-FILMS AT LOW-TEMPERATURE

被引：27

作者：

COBIANU, C

PAVELESCU, C

机构：

来源：

关键词：

D O I：

10.1016/0040-6090(83)90052-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：361 / 366

页数：6

共 16 条

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