BARRIERS AGAINST COPPER DIFFUSION INTO SILICON AND DRIFT THROUGH SILICON DIOXIDE

被引:186
作者
WANG, SQ
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关键词
D O I
10.1557/S0883769400047710
中图分类号
T [工业技术];
学科分类号
08 ;
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[No abstract available]
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页码:30 / 40
页数:11
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  • [72] IR-ZR ALLOYS AS DIFFUSION-BARRIERS BETWEEN CU AND SI(100)
    YANG, H
    GILMORE, CM
    RAMAKER, DE
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (04): : 1454 - 1457