EXPERIMENTAL EVALUATION OF A SCANNING TUNNELING MICROSCOPE-MICROLENS SYSTEM

被引:20
作者
MURAY, LP
STAUFER, U
BASSOUS, E
KERN, DP
CHANG, THP
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1991年 / 9卷 / 06期
关键词
D O I
10.1116/1.585633
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents the results of the first successfully fabricated scanning tunneling microscope (STM) aligned field emission (SAFE) microsource. SAFE sources have been shown to produce 2-3 orders of magnitude improvement in brightness over conventional field-emission sources. Lens electrodes were fabricated from 1-mu-m thick silicon membranes by electron-beam lithography and reactive-ion-beam etching. Two-element microlenses were tested in an ultrahigh vacuum (UHV) chamber with a piezo mounted tungsten tip and a dual feedback system. The sources demonstrated stable emission for periods of hours at beam energies of up to 1 kV. Measurement of the virtual source position showed good agreement with calculated values.
引用
收藏
页码:2955 / 2961
页数:7
相关论文
共 12 条
  • [11] WILSON RG, 1973, ION BEAMS APPLICATIO, P319
  • [12] GENERATION AND APPLICATIONS OF FINELY FOCUSED BEAMS OF LOW-ENERGY ELECTRONS
    YAU, YW
    PEASE, RFW
    IRANMANESH, AA
    POLASKO, KJ
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1048 - 1052