ULTRAVIOLET PHOTOEMISSION STUDIES OF OXIDATION OF THIN BI FILMS USING SYNCHROTRON RADIATION

被引：17

作者：

BENBOW, RL ^{[1
]}

HURYCH, Z ^{[1
]}

机构：

[1] NO ILLINOIS UNIV,DEPT PHYS,DEKALB,IL 60115

来源：

PHYSICAL REVIEW B | 1976年 / 14卷 / 10期

关键词：

D O I：

10.1103/PhysRevB.14.4295

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：4295 / 4303

页数：9

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