APPLICATION OF EMISSION-SPECTROSCOPY FOR PROFILE CONTROL DURING OXYGEN RIE OF THICK PHOTORESIST

被引：18

作者：

SOLLER, BR

SHUMAN, RF

ROSS, RR

机构：

[1] SPERRY RES CTR,SUDBURY,MA 01776

[2] COLL HOLY CROSS,WORCESTER,MA 01610

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1984年 / 131卷 / 06期

关键词：

D O I：

10.1149/1.2115820

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1353 / 1356

页数：4

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