SOFT-X-RAY CONTACT MICROSCOPY WITH NANOSECOND EXPOSURE TIMES

被引：18

作者：

ROSSER, RJ

BALDWIN, KG

FEDER, R

BASSETT, D

COLES, A

EASON, RW

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

[2] RUTHERFORD APPLETON LAB,DIDCOT OX11 0QX,OXON,ENGLAND

来源：

JOURNAL OF MICROSCOPY-OXFORD | 1985年 / 138卷 / JUN期

关键词：

D O I：

10.1111/j.1365-2818.1985.tb02625.x

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

引用

页码：311 / 319

页数：9

共 8 条

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FEDER, R
SPILLER, E
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BROERS, AN
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ZADUNAISKY, ZA
SEDAT, J
[J]. SCIENCE, 1977, 197 (4300) : 259 - 260
[4] FEDER R, 1985, SCIENCE
[5] Goby P, 1913, CR HEBD ACAD SCI, V156, P686
[6] SYNCHROTRON RADIATION X-RAY-LITHOGRAPHY
HAELBICH, RP
SILVERMAN, JP
WARLAUMONT, JM
[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 1984, 222 (1-2) : 291 - 301
[7] ROSSER RJ, 1984, XRAY MICROSCOPY, P242
[8] SAYRE D, 1981, P SOC PHOTO-OPT INST, V316, P56