MICROSTRUCTURE IN THIN CARBON-FILMS

被引：3

作者：

GONZALEZHERNANDEZ, J ^{[1
]}

VAZQUEZLOPEZ, C ^{[1
]}

ZUNIGASEGUNDO, A ^{[1
]}

CHAO, BS ^{[1
]}

机构：

[1] ENERGY CONVERS DEVICES INC,TROY,MI 48084

来源：

SOLID STATE COMMUNICATIONS | 1993年 / 87卷 / 01期

关键词：

D O I：

10.1016/0038-1098(93)90529-V

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

Atomic force microscopy has been used to study the surface irregularities of hydrogenated and unhydrogenated carbon films grown by rf-powered glow discharge and dc-magnetron sputtering, respectively. It is found that films produced with the latter technique have rougher surfaces.- Roughness can be reduced by increasing the rf-power density in glow discharge films and by decreasing the substrate temperature in sputtered films.

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页码：23 / 26

页数：4

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