RESISTANCE FLUCTUATIONS DUE TO HYDROGEN DIFFUSION IN NIOBIUM THIN-FILMS

被引：43

作者：

SCOFIELD, JH ^{[1
]}

WEBB, WW ^{[1
]}

机构：

[1] CORNELL UNIV,SCH APPL & ENGN PHYS,ITHACA,NY 14853

来源：

PHYSICAL REVIEW LETTERS | 1985年 / 54卷 / 04期

关键词：

D O I：

10.1103/PhysRevLett.54.353

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：353 / 356

页数：4

共 28 条

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