RAPID SOLIDIFICATION STUDIES OF A MODEL ALLOY SYSTEM

被引:19
作者
THOMPSON, MO
PEERCY, PS
TSAO, JY
AZIZ, MJ
机构
[1] SANDIA NATL LABS,ALBUQUERQUE,NM 87185
[2] OAK RIDGE NATL LAB,OAK RIDGE,TN 37831
关键词
D O I
10.1063/1.97094
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:558 / 560
页数:3
相关论文
共 10 条
[1]   THERMAL CONDUCTIVITY OF GE-SI ALLOYS AT HIGH TEMPERATURES [J].
ABELES, B ;
BEERS, DS ;
DISMUKES, JP ;
CODY, GD .
PHYSICAL REVIEW, 1962, 125 (01) :44-&
[2]   TIME-RESOLVED REFLECTIVITY OF ION-IMPLANTED SILICON DURING LASER ANNEALING [J].
AUSTON, DH ;
SURKO, CM ;
VENKATESAN, TNC ;
SLUSHER, RE ;
GOLOVCHENKO, JA .
APPLIED PHYSICS LETTERS, 1978, 33 (05) :437-440
[3]  
Baeri P., 1981, Laser and Electron-Beam Solid Interactions and Materials Processing. Proceedings of the Materials Research Society Symposium, P39
[4]  
DISMUKES JP, 1965, T METALL SOC AIME, V233, P672
[5]   HEAT OF CRYSTALLIZATION AND MELTING-POINT OF AMORPHOUS-SILICON [J].
DONOVAN, EP ;
SPAEPEN, F ;
TURNBULL, D ;
POATE, JM ;
JACOBSON, DC .
APPLIED PHYSICS LETTERS, 1983, 42 (08) :698-700
[6]   MEASUREMENT OF THE VELOCITY OF THE CRYSTAL-LIQUID INTERFACE IN PULSED LASER ANNEALING OF SI [J].
GALVIN, GJ ;
THOMPSON, MO ;
MAYER, JW ;
HAMMOND, RB ;
PAULTER, N ;
PEERCY, PS .
PHYSICAL REVIEW LETTERS, 1982, 48 (01) :33-36
[7]   THERMAL-CONDUCTIVITY OF AMORPHOUS-SILICON [J].
GOLDSMID, HJ ;
KAILA, MM ;
PAUL, GL .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1983, 76 (01) :K31-K33
[8]  
Hansen M., 1958, J ELECTROCHEM SOC, DOI DOI 10.1149/1.2428700
[9]   KINETICS OF LASER-INDUCED SOLID-PHASE EPITAXY IN AMORPHOUS-SILICON FILMS [J].
KOKOROWSKI, SA ;
OLSON, GL ;
HESS, LD .
JOURNAL OF APPLIED PHYSICS, 1982, 53 (02) :921-926
[10]   MELTING TEMPERATURE AND EXPLOSIVE CRYSTALLIZATION OF AMORPHOUS-SILICON DURING PULSED LASER IRRADIATION [J].
THOMPSON, MO ;
GALVIN, GJ ;
MAYER, JW ;
PEERCY, PS ;
POATE, JM ;
JACOBSON, DC ;
CULLIS, AG ;
CHEW, NG .
PHYSICAL REVIEW LETTERS, 1984, 52 (26) :2360-2363