ADHESION ENHANCEMENT INDUCED BY MEV ION-BEAMS

被引：23

作者：

LIVI, RP ^{[1
]}

机构：

[1] CALTECH,DIV PHYS MATH & ASTRON,PASADENA,CA 91125

来源：

关键词：

D O I：

10.1016/0168-583X(85)90305-2

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：545 / 548

页数：4

共 22 条

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[J]. THIN SOLID FILMS, 1969, 4 (01) : 41 - &
[4] ION-BEAM-ENHANCED ADHESION IN THE ELECTRONIC STOPPING REGION
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[5] HEADRICK RL, 1984, APPL PHYS LETT
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[7] THE USE OF FAST HEAVY-IONS TO IMPROVE THIN-FILM ADHESION
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[J]. THIN SOLID FILMS, 1983, 107 (01) : 89 - 98
[8] THE EFFECT OF ION-BOMBARDMENT ON STRESS AND ADHESION IN THIN-FILMS OF SILVER AND ALUMINUM
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[J]. THIN SOLID FILMS, 1981, 81 (01) : 61 - 69
[9] MENDENHALL MH, 1983, THESIS CALTECH
[10] THIN-FILM ADHESION CHANGES INDUCED BY ELECTRON-IRRADIATION
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ELLIMAN, RG
[J]. APPLIED PHYSICS LETTERS, 1984, 44 (02) : 193 - 195