HIGH BRIGHTNESS LASER PLASMA SOURCE FOR HIGH THROUGHPUT SUB-MICRON X-RAY-LITHOGRAPHY

被引：10

作者：

HOFFMAN, AL

ALBRECHT, GF

CRAWFORD, EA

机构：

[1] Mathematical Sciences Northwest Inc,, Bellevue, WA, USA, Mathematical Sciences Northwest Inc, Bellevue, WA, USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1985年 / 3卷 / 01期

关键词：

D O I：

10.1116/1.583239

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

X-RAY AND GAMMA RAY PRODUCTION

引用

页码：258 / 261

页数：4

共 4 条

[1] SLAB-GEOMETRY ND-GLASS LASER PERFORMANCE STUDIES [J].

EGGLESTON, JM ;

KANE, TJ ;

UNTERNAHRER, J ;

BYER, RL .

OPTICS LETTERS, 1982, 7 (09) :405-407

[2]

EPSTEIN HM, 1983, P SOC PHOTO-OPT INST, V385, P141, DOI 10.1117/12.934968

[3] CHARACTERIZATION OF LASER-PRODUCED PLASMA X-RAY SOURCES FOR USE IN X-RAY RADIOGRAPHY [J].

MATTHEWS, DL ;

CAMPBELL, EM ;

CEGLIO, NM ;

HERMES, G ;

KAUFFMAN, R ;

KOPPEL, L ;

LEE, R ;

MANES, K ;

RUPERT, V ;

SLIVINSKY, VW ;

TURNER, R ;

ZE, F .

JOURNAL OF APPLIED PHYSICS, 1983, 54 (08) :4260-4268

[4] SUB-MICRON X-RAY-LITHOGRAPHY USING LASER-PRODUCED PLASMA AS A SOURCE [J].

YAAKOBI, B ;

KIM, H ;

SOURES, JM ;

DECKMAN, HW ;

DUNSMUIR, J .

APPLIED PHYSICS LETTERS, 1983, 43 (07) :686-688

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