SUB-MICRON X-RAY-LITHOGRAPHY USING LASER-PRODUCED PLASMA AS A SOURCE

被引：35

作者：

YAAKOBI, B ^{[1
]}

KIM, H ^{[1
]}

SOURES, JM ^{[1
]}

DECKMAN, HW ^{[1
]}

DUNSMUIR, J ^{[1
]}

机构：

[1] EXXON RES & ENGN CO,CORP RES LABS,LINDEN,NJ 07036

来源：

APPLIED PHYSICS LETTERS | 1983年 / 43卷 / 07期

关键词：

D O I：

10.1063/1.94535

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：686 / 688

页数：3

共 14 条

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[4] Mallozzi P. J., 1979, Advances in X-ray Analysis, volume 22, P267
[5] LASER-PLASMA INTERACTIONS AT 0.53 MU-M FOR DISK TARGETS OF VARYING-Z
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[6] SUBMICROSECOND X-RAY LITHOGRAPHY
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[J]. ELECTRONICS LETTERS, 1978, 14 (24) : 781 - 782
[7] X-RAY-LITHOGRAPHY USING A PULSED PLASMA SOURCE
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1190 - 1193
[8] GDL - A HIGH-POWER 0.35-MU-M LASER IRRADIATION FACILITY
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SOURES, JM
JACOBS, SD
LUND, LD
CRAXTON, RS
[J]. IEEE JOURNAL OF QUANTUM ELECTRONICS, 1981, 17 (09) : 1689 - 1693
[9] DEMONSTRATION OF HIGH-EFFICIENCY THIRD-HARMONIC CONVERSION OF HIGH-POWER ND-GLASS LASER-RADIATION
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RIZZO, JE
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[J]. OPTICS COMMUNICATIONS, 1980, 34 (03) : 469 - 473
[10] SPILLER E, 1977, TOPICS APPLIED PHYSI, P49

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