THERMAL-ANALYSIS OF NICKEL-OXIDE FILMS

被引：21

作者：

BUKOVEC, P ^{[1
]}

BUKOVEC, N ^{[1
]}

OREL, B ^{[1
]}

WISSIAK, KS ^{[1
]}

机构：

[1] INST CHEM,LJUBLJANA 61000,SLOVENIA

来源：

JOURNAL OF THERMAL ANALYSIS | 1993年 / 40卷 / 03期

关键词：

NICKEL OXIDE FILMS; SEMICONDUCTING MATERIALS;

D O I：

10.1007/BF02546882

中图分类号：

O414.1 [热力学];

学科分类号：

摘要：

Nickel oxide films were prepared by chemical deposition on glass substrates using nickel sulphate and potassium persulphate in ammonia solution. Coatings dried in air and at 85-degrees-C were characterized by thermal analysis (TG and DTG), FT-IR spectroscopy and X-ray diffraction. The films could be formulated as hydrated forms of 4Ni(OH)2.NiOOH and Ni3O2(OH)4 respectively. The coatings lost water and oxygen on heating to give NiO.

引用

页码：1193 / 1196

页数：4

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