A CHEMICAL METHOD FOR THE DEPOSITION OF NICKEL-OXIDE THIN-FILMS

被引：53

作者：

PRAMANIK, P

BHATTACHARYA, S

机构：

[1] Department of Chemistry, Indian Institute of Technology

来源：

关键词：

D O I：

10.1149/1.2086316

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

[No abstract available]

引用

页码：3869 / 3870

页数：2

共 7 条

[1] Electrical and optical properties of narrow-band materials [J].

Adler, David ;

Feinleib, Julius .

PHYSICAL REVIEW B-SOLID STATE, 1970, 2 (08) :3112-3134

[2]

Lampert C. M., 1984, SOLAR ENERGY MAT, V11, P27

[3] REACTIVELY SPUTTERED OXIDE FILMS [J].

LIEBERMAN, ML ;

MEDRUD, RC .

RECHTIN, MD ;

AVERBACH, BL .

ROSSI, CE ;

PAUL, W .

[6] PHOTOCONDUCTIVITY IN DISORDERED NICKEL-OXIDE FILMS [J].

TSU, R ;

ESAKI, L ;

LUDEKE, R .

[7]

4835 JOINT COMM POWD