EFFECT OF FLAT-BAND VOLTAGE SHIFT AND NONVOLATILE MEMORY IN PLATINUM-DIFFUSED METAL-OXIDE-SEMICONDUCTOR DEVICES

被引:5
作者
KATO, H
MORI, S
KUWANO, H
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10.1063/1.334043
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O59 [应用物理学];
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页码:1160 / 1164
页数:5
相关论文
共 6 条
[1]   INFLUENCE OF PLATINUM IN SI SIO2 SYSTEM [J].
BROTHERTON, SD .
SOLID-STATE ELECTRONICS, 1970, 13 (07) :1113-+
[2]   PREVENTION OF CMOS LATCH-UP BY GOLD DOPING [J].
DAWES, WR ;
DERBENWICK, GF .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1976, 23 (06) :2027-2030
[3]   SURFACE STATES IN SILICON FROM CHARGES IN OXIDE COATING [J].
GOETZBERGER, A ;
HEINE, V ;
NICOLLIAN, EH .
APPLIED PHYSICS LETTERS, 1968, 12 (03) :95-+
[4]   DENSITY OF SIO2-SI INTERFACE STATES - (MOS DEVICES SI OXIDATION 100 DEGREES C O2 + 80 PPM H2O FERMI LEVEL E) [J].
GRAY, PV ;
BROWN, DM .
APPLIED PHYSICS LETTERS, 1966, 8 (02) :31-&
[5]  
NASSIBIAN AG, 1980, IEEE T ELECTRON DEVI, V27, P9
[6]  
NASSIBIAN AG, 1981, IEEE T ELECTRON DEVI, V28, P9