A SIMPLE IR SPECTROSCOPIC METHOD FOR DETERMINING FICTIVE TEMPERATURE OF SILICA GLASSES

被引：237

作者：

AGARWAL, A ^{[1
]}

DAVIS, KM ^{[1
]}

TOMOZAWA, M ^{[1
]}

机构：

[1] RENSSELAER POLYTECH INST,DEPT MAT ENGN,TROY,NY 12180

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1995年 / 185卷 / 1-2期

关键词：

D O I：

10.1016/0022-3093(94)00676-8

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Infrared spectroscopy was used to determine fictive temperature of silica glasses. Positions of both the fundamental structural band at similar to 1122 cm(-1) monitored in infrared (IR) reflection mode and an overtone of this band at similar to 2260 cm(-1) monitored in IR transmission mode were found to be directly correlated with the glass fictive temperature. At any particular fictive temperature, the equilibrium structural band positions were found to be independent of the impurity content, such as hydroxyl, in different types of silica glass. From band shifts, the average Si-O-Si bond angle was computed to decrease by about 1.3 degrees when the fictive temperature increased from 950 to 1400 degrees C. Using this method, fictive temperatures of various as-received silica glasses were determined.

引用

页码：191 / 198

页数：8