FORMATION OF CHARGE-REDUCED SI4+ SPECIES IN SIO2 THIN-FILM BY SUPPORTED METAL PARTICLES - POSSIBILITY OF ELECTRONIC METAL-SUPPORT INTERACTION IN SILICA-SUPPORTED METAL-CATALYSTS

被引：1

作者：

SHIMAGUCHI, T

KOMIYAMA, M

机构：

[1] Faculty of Liberal Arts and Education, Yamanashi University

来源：

NIPPON KAGAKU KAISHI | 1995年 / 06期

关键词：

D O I：

10.1246/nikkashi.1995.490

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Metal-support interaction (MSI) in catalysts supported on silica was studied with model catalyst systems in which metal particles were deposited on a thin film silica surface. X-Ray photoelectron spectroscopy on these model catalyst surfaces revealed the formation of charge-reduced Si4+ species due to the deposition of metal particles. The amount of the charge-reduced Si4+ species paralleled the amount of the metal deposited on the surface.

引用

页码：490 / 491

页数：2